Патент США № | 6262527 |
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Автор(ы) | Van Zutphen и др. |
Дата выдачи | 17 июля 2001 г. |
Cathode ray tube comprising an electron gun which is constructed in such a way that the gas pressure near the electron-emissive layer (30) of the cathode is lower than in the other parts of the tube. This can be achieved by reducing the aperture between the G1 (33) and G2 (36), by providing the G2 (36) with a skirt (43). The wall of the skirt, the G1 and the G2 may also be at least partly coated with a getter (41).
Авторы: | Tom Van Zutphen (Eindhoven, NL), Frederik C. Gehring (Eindhoven, NL) |
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Заявитель: | U.S. Philips Corporation (New York, NY) |
ID семейства патентов | 8228767 |
Номер заявки: | 09/153,776 |
Дата регистрации: | 15 сентября 1998 г. |
Sep 29, 1997 [EP] | 97202978 | |||
Класс патентной классификации США: | 313/481; 313/547 |
Класс совместной патентной классификации: | H01J 29/04 (20130101); H01J 29/94 (20130101); H01J 29/485 (20130101); H01J 2201/308 (20130101) |
Класс международной патентной классификации (МПК): | H01J 29/94 (20060101); H01J 29/00 (20060101); H01J 29/48 (20060101); H01J 29/04 (20060101); H01J 031/00 () |
Область поиска: | ;313/414,481,545,546,547,548,553,558,559,560,310,326 |
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