Ïàòåíò ÑØÀ ¹ | 6794598 |
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Àâòîð(û) | Huang è äð. |
Äàòà âûäà÷è | S21 eptember 2004 ã. |
An arc electrode structure, for producing carbon nanostructures, which includes a first electrode and two or more second electrodes disposed within a chamber is provided. The electrodes are connected to a voltage potential to produce an arc-plasma region. The first electrode has a sloped surface with a plurality of holes therein for holding catalyst. The first electrode's sloped surface, and the positioning of the plurality of second electrodes allows control of the direction and region of arc-plasma. Further, the first electrode has a central bore which may be either a blind bore, or a through bore. The blind bore collects unwanted deposits that slide off of the sloped surface of the first electrode. The throughbore either allows soot and carbon nanostructures to be removed from the chamber, or allows organic vapor to be introduced into the chamber. When the throughbore is used to introduce organic vapor into the chamber, the vapor is directed through the arc-plasma region so that carbon nanostructures are built up by a CVD process rather than being broken off of carbon electrodes.
Àâòîðû: | Houjin Huang (Kanagawa, JP), Hisashi Kajiura (Kanagawa, JP), Mitsuaki Miyakoshi (Kanagawa, JP), Atsuo Yamada (Kanagawa, JP), Masashi Shiraishi (Tokyo, JP) |
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Çàÿâèòåëü: | Sony Corporation (Tokyo, JP) |
ID ñåìåéñòâà ïàòåíòîâ | 18844123 |
Íîìåð çàÿâêè: | 10/433,028 |
Äàòà ðåãèñòðàöèè: | 25 èþëÿ 2003 ã. |
PCT Filed: | December 07, 2001 |
PCT No.: | PCT/JP01/10712 |
PCT Pub. No.: | WO02/47109 |
PCT Pub. Date: | June 13, 2002 |
Dec 8, 2000 [JP] | 2000-375044 | |||
Êëàññ ïàòåíòíîé êëàññèôèêàöèè ÑØÀ: | 219/121.11; 204/173; 219/121.56; 373/60; 977/843; 977/844; 977/896 |
Êëàññ ñîâìåñòíîé ïàòåíòíîé êëàññèôèêàöèè: | B82Y 10/00 (20130101); B82Y 30/00 (20130101); H01J 37/32055 (20130101); H01J 37/32532 (20130101); H01J 37/3255 (20130101); H01J 37/32541 (20130101); Y10S 977/844 (20130101); Y10S 977/896 (20130101); Y10S 977/843 (20130101) |
Êëàññ ìåæäóíàðîäíîé ïàòåíòíîé êëàññèôèêàöèè (ÌÏÊ): | H01J 37/32 (20060101); B23K 015/00 (); D01F 009/12 () |
Îáëàñòü ïîèñêà: | ;373/60,61,62,63,66 ;219/121.11,121.36,121.37,121.38,121.54,121.55,121.56,121.57 ;204/173 ;423/445B,447.1,447.7 ;205/104,192,157 ;428/411.1,446 |
5876684 | March 1999 | Withers et al. |
6063243 | May 2000 | Zettl et al. |
6149775 | November 2000 | Tsuboi et al. |
2002/0046953 | April 2002 | Lee et al. |
2004/0052289 | March 2004 | Chang |
11-263609 | Nov 2000 | JP | |||
Colbert et al., Growth and Sintering of Fullerene Nanotubes, Science, vol. 266, Nov. 1994, pp. 1218-1222. . Lamb et al., Fullerene Production, J. Phys. Chem. Solids, vol. 54, No. 12, (1993) pp. 1635-1643. . Ando et al., Mass production of single-wall carbon nanotubes by the arc plasma jet method, Chemical Physics Letter, vol. 323 (2000) pp. 580-585. . Saito et al., Encapsulation of Tic and HFC Crystallites within Graphite Cages by Arc Discharge, Carbon, vol. 35, No. 12, (1997) pp. 1757-1763.. |